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KCR-25 Chrome Plating Brightener with Fast Deposition Speed Chloride-Free Formula for High Micro-Hardness Hard Chromium Plating

KCR-25 Chrome Plating Brightener with Fast Deposition Speed Chloride-Free Formula for High Micro-Hardness Hard Chromium Plating

  • Evidenziare

    Fast Deposition Speed Chrome Plating Brightener

    ,

    Chloride-Free Hard Chromium Plating Additive

    ,

    High Micro-Hardness KCR-25 Brightener

  • Articolo
    Agente ausiliario chimico
  • Tipo
    Cromo di lucentezza
  • Caratteristiche
    Grado industriale
  • Modello
    KCR-25
  • Luogo di origine
    Cina
  • Marca
    FENGFAN
  • Numero di modello
    KCR-25
  • Quantità di ordine minimo
    Negoziabile
  • Prezzo
    Negoziabile
  • Imballaggi particolari
    Packaging di esportazione standard
  • Tempi di consegna
    15-25 giorni di lavoro
  • Termini di pagamento
    L/C, D/A, D/P, T/T, Western Union, MoneyGram
  • Capacità di alimentazione
    200000pcs/giorno

KCR-25 Chrome Plating Brightener with Fast Deposition Speed Chloride-Free Formula for High Micro-Hardness Hard Chromium Plating


KCR-25 Hard Chrome Plating Chemicals Brightener High Cathode Efficiency


1. Properties


1. With high cathode efficiency, it may be up to 23%-26%.


2. The current density even over 60A/dm2 is available.


3. The deposition speed for KCR-25 bath is 2-3 times faster than conventional hard chromium process.


4. It is chloride-free, the KCR-25 process dose not cause erosion of the workpiece in low current density area.


5. The micro-hardness of the plating is up to 950HV-1100HV100.


6. The amount of the micro cracks of the plating may be up to 400/cm, so it improves the corrosion resistance ability of the plating.


2. Bath composition & Operation condition



Operation range

Standard

Chromium trioxide

200~275g/L

250g/L

KCR-25 Catalyst


20ml/L

Sulfuric acid

2.5~4g/L

2.7g/L

Temperature

50~60℃

58℃

Cathode current density(Dk)

50~75A/dm2

60A/dm2

Anodic current density

15~30A/dm2

30A/dm2



3. Reference Data


1. Deposition rate


Current Density (A/dm2)

Deposition rate (μm/h)

30

20-35

45

40-50

60

50-70

7.5

70-90


2. Bath density and concentration of chromic anhydride control



Chromium trioxide


Bath density

Baume degree (15)

Baume degree (60)

180

1.13

16.7

16.7

195

1.14

17.8

15.9

210

1.15

18.9

17.0

225

1.16

20.0

18.1

240

1.17

21.1

19.1

255

1.18

22.1

20.1

270

1.19

23.2

21.0

285

1.20

24.2

21.9

300

1.21

25.2

22.7